Rectangular-shaped laser beam realizes a beautiful scribing line.
This system performs the scribing of patterns on various substrates: transparent electrodes (ITO or FTO) or metal electrodes used for flat panel displays, including touch screens, and photovoltaic cells of amorphous silicon (a-Si), metal compounds (CIGS), dye-sensitized types, or organic thin films; and energy conversion layers (a-Si) of photovoltaic cells. Combining our "top hat beam" technology, which was created by means of our unique special optics technologies, and our automated machine technologies, this system is equipped with a positioning function that uses image processing technology in order to provide uniform and ultra-precise scribing.
By using the reliable fiber delivery method, it enables the scribing of substrates with a maximum size of 1200 mm - 1600 mm to be performed at a fast speed of up to 2 m/s, greatly contributing to improving production efficiency by reducing takt times.
This system is best suited to P1-P3 processes, as it is equipped with fundamental mode (1064 nm) lasers for the P1 process and SHG (532 nm) lasers for the P2 or P3 process.
* We offer solutions or machine designs that are ideally suited to your processing priorities.